- photoresist residue
- photoresist residue MH Photolackrest m
English-German dictionary of Electrical Engineering and Electronics. 2013.
English-German dictionary of Electrical Engineering and Electronics. 2013.
Graphene — is a one atom thick planar sheet of sp2 bonded carbon atoms that are densely packed in a honeycomb crystal lattice. It can be viewed as an atomic scale chicken wire made of carbon atoms and their bonds. The name comes from GRAPHITE + ENE;… … Wikipedia
Piranha solution — Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2), used to clean organic residues off substrates. Because the mixture is a strong oxidizer, it will remove most organic matter, and it… … Wikipedia
materials science — the study of the characteristics and uses of various materials, as glass, plastics, and metals. [1960 65] * * * Study of the properties of solid materials and how those properties are determined by the material s composition and structure, both… … Universalium
Polymer — Appearance of real linear polymer chains as recorded using an atomic force microscope on surface under liquid medium. Chain contour length for this polymer is 204 nm; thickness is 0.4 nm.[1] A polymer is a large molecule (macromolecule … Wikipedia
1,1,1-Trichloroethane — Not to be confused with 1,1,1 Trifluoroethane. 1,1,1 Trichloroethane … Wikipedia
Ashing — AshingDepending on context, this may refer to plasma ashing, which is used in semiconductor manufacturing and MEMS for removing photoresist, or it may refer to the process below:A test to deduce the amount of ash forming material present in a… … Wikipedia